of organic, inorganic and hybrid devices is completed in this multi-functional
facility offering solution-processing methods (inkjet printing, small scale
gravure and offset printing, meniscus and blade coating, spray coating, etc.) in controlled or inert
environments. In addition to standard
device characterization equipment, the lab offers characterization of PV
devices in inert atmospheres conducted on state-of-the-art equipment, including
photo-CELIV and PCT Photoelectric defect analysis.
This facility hosts research equipment under inert environment including:
Small scale gravure and offset printing
Meniscus and blade coating
Vacuum deposition facility including thermal, sputtering, e-beam, and ion-beam sputtering
Research scale device testing facility
Research scale encapsulation capability
Plasma and ozone treatment capability
Nanoembossing and nanoimprint capability, and supporting tools
OLEDs and solar cell testing
Impedance measurement, etc...
Moreover, stand alone inkjet printers, stand alone spin coater for photo resist and aqueous based materials, direct write system, and other supporting tools are available. A dedicated chemistry facility having inert environment synthetic capability is also available.