Brand: Zeiss

Model: Auriga

This Zeiss Auriga workstation is a crossbeam high resolution SEM equipped with Focus Ion Beam (FIB) column and EDS allowing for unique imaging possibilities, advanced analytics and precise processing at a nanoscale level. The main features of the equipment are:

• A Schottky Field Emitter, resolution of 1.0 nm @ 15 kV, 1.9 nm @ 1 kV, acceleration voltage between 0.1 and 30 kV.
  
• A dual SEM and FIB column
  
• Ga liquid metal ion source (LMIS), resolution <7 nm @ 30 kV, acceleration voltage between 1 and 30 kV, probe current between 1 pA and 50 nA.
  
• Detectors: secondary electrons (SE), In-Lens SE and BSD detectors
  
• Possibility of 3D reconstruction using combined SEM and FIB columns.
  
• Energy dispersive spectroscopy (Quantax EDS from Brucker).
  
• Gas injection system.
  
• Nanolithography using electrons or ions, milling of imported bitmaps or CAD files, electrostatic beam blanker