Advanced Thin Film Deposition Laboratory

​​Cleanroom research space featuring class 1000 and class 100 cleanroom zones with state of the art gas-phase deposition facilities. These tools allow researchers and students to carry out fundamental and applied studies related to vacuum deposited CIGS (Copper Indium Gallium Selenide) and related materials systems including rare indium and gallium metals; amorphous and microcrystalline Si; triple and multi-junction solar cell fabrication; large area (> 6"x 6") printed solar cells; photolithography; plasma etching and screen printing.

Among other highlights the cleanroom features:

  • Plasma-enhanced chemical vapor deposition
  • Atomic layer deposition
  • UV to IR ellipsometry
  • Advanced photoresist processing system
  • Wet bench silicon etching and cleaning
  • Fast ramping thermal processing
  • Laser patterning
  • Spin coating
  • Large-area inkjet printing
  • Scanning electron microscopy