Device Fabrication and Characterization Laboratory

This multi-functional facility allows fabrication of organic, inorganic and hybrid semiconductor devices based on a wide range of processing methods in controlled and inert environment.  In addition to standard device characterization equipment, the lab offers advanced equipment for PV device analysis in inert atmospheres (28 gloveboxes).

This facility hosts research equipment under inert environment including:

  • Small scale gravure and offset printers
  • Screen printers
  • Meniscus and blade coaters
  • Spray coaters
  • Vacuum deposition chambers featuring thermal evaporation, sputtering, e-beam, and ion-beam sputtering
  • Research-scale device testing equipment
  • Multiprobe units
  • Research scale encapsulation instrumentation
  • Plasma and ozone treatment capability
  • Spin coaters